Fabricating Ordered 2-D Nano-Structured Arrays Using Nanosphere Lithography

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Abstract

Recent advances in the use of plasmonic metamaterials to improve absorption of light in thin-film solar photovoltaic devices has created a demand for a scalable method of patterning large areas with metal nanostructures deposited in an ordered array. This article describes two methods of fabricating ordered 2D nanosphere colloidal films: spin coating and interface coating. The two methods are compared and parameter optimization discussed. The study reveals that:

  • For smaller nanosphere sizes, spin coating is more favorable, while for larger nanospheres, the angled interface coating provides more coverage and uniformity.
  • A surfactant-free approach for interface coating is developed to fabricate zero-contamination colloidal films.
  • Each of the methods reaches an overall coverage of more than 90% and can be used for nanosphere lithography to form plasmonic metamaterials.

Keywords[edit | edit source]

 microsphere lithography; plasmonic; nanosphere lithography; dip coating; spin coating; nanosphere; plasmonic; metamaterial; photovoltaic; synthesis

Methods[edit | edit source]

Detailed methods in the paper - also supported by:

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