| Authors | Chenlong Zhang Sandra Cvetanovic J.M.Pearce |
|---|---|
| Location | Michigan, USA |
| Status | Designed Modelled Prototyped Verified |
| Verified by | MOST |
| Links | https://www.academia.edu/34554395/Fabricating_ordered_2_D_nano_structured_arrays_using_nanosphere_lithography%7C https://www.sciencedirect.com/science/article/pii/S2215016117300213?via%3Dihub%7C |
| Design files | https://www.youmagine.com/designs/dip-holder-for-nanosphere-lithography YouMagine.com |
|---|---|
| Hardware license | CERN-OHL-S |
| Certifications | Start OSHWA certification |
Recent advances in the use of plasmonic metamaterials to improve absorption of light in thin-film solar photovoltaic devices has created a demand for a scalable method of patterning large areas with metal nanostructures deposited in an ordered array. This article describes two methods of fabricating ordered 2D nanosphere colloidal films: spin coating and interface coating. The two methods are compared and parameter optimization discussed. The study reveals that:
- For smaller nanosphere sizes, spin coating is more favorable, while for larger nanospheres, the angled interface coating provides more coverage and uniformity.
- A surfactant-free approach for interface coating is developed to fabricate zero-contamination colloidal films.
- Each of the methods reaches an overall coverage of more than 90% and can be used for nanosphere lithography to form plasmonic metamaterials.
- 3D printed parametric dipper https://www.youmagine.com/designs/dip-holder-for-nanosphere-lithography
