Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations
This study experimentally investigates the fractal nature of the DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.
Highlights
[edit | edit source]- Indium-tin oxide (ITO) thin films fabricated by DC magnetron sputtering method.
- ITO films prepared under different mixed sputtering ambient.
- Three-dimensional (3-D) micromorphology analysis of sputtered ITO thin films.
- Fractal geometry analyzed by areal autocorrelation function and pseudo-topothesy K.
- Influence of sputtering ambient on 3-D micromorphology correlated.
Keywords
[edit | edit source]Indium-tin oxide thin film; different sputtering ambient; atomic force microscopy; fractal analysis; and surface topography
See also
[edit | edit source]- Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films
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| License | CC-BY-SA-3.0 |
| Cite as | J.M.Pearce (2018–2026). "Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations". Appropedia. Retrieved June 3, 2026. |