Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations

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Abstract

Afmmicromorphanalysis.jpg

This study experimentally investigates the fractal nature of the DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.

Highlights[edit | edit source]

  • Indium-tin oxide (ITO) thin films fabricated by DC magnetron sputtering method.
  • ITO films prepared under different mixed sputtering ambient.
  • Three-dimensional (3-D) micromorphology analysis of sputtered ITO thin films.
  • Fractal geometry analyzed by areal autocorrelation function and pseudo-topothesy K.
  • Influence of sputtering ambient on 3-D micromorphology correlated.

Keywords[edit | edit source]

Indium-tin oxide thin film; different sputtering ambient; atomic force microscopy; fractal analysis; and surface topography

See also[edit | edit source]