Atomic layer deposition:MOST

From Appropedia

Sunhusky.png Michigan Tech's Open Sustainability Technology Lab.

Wanted: Students to make a distributed future with solar-powered open-source 3-D printing and recycling.
Contact Dr. Joshua Pearce - Apply here

MOST: Projects & Publications, Methods, Lit. reviews, People, Sponsors, News
Updates: Twitter, YouTube

Create-Joshua-Pearce.png

Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. ALD reactions generally use two chemicals, typically called precursors. These precursors react with a surface one at a time in a sequential, self-limiting, manner. Thus it is possible to deposit a very precise thin film by exposing the precursors to the growth surface repeatedly. MOST uses ALD techniques to fabricate solar photovoltaic devices.

For more information on ALD http://web.archive.org/web/20190824065133/http://www.aldpulse.com:80/

MOST ALD[edit | edit source]

  • Jusung / JEL Atomic Layer Deposition ALD Chamber 200mm. This chamber was removed from a Jusung Eureka 2000 system using a Brooks MX-700 Cluster Platform.

Other MTU researchers[edit | edit source]

MSDS[edit | edit source]

As received exposed to:

See also[edit | edit source]