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{{MOST}}{{Lit}}
{{MOST}}{{Lit}}
LINK:"http://www.nrel.gov/docs/fy11osti/50063.pdf"
1:LINK:"http://www.nrel.gov/docs/fy11osti/50063.pdf"


Abstract:Reasons for choosing Etching process
Abstract:Reasons for choosing Etching process
Reference:Award-Winning Etching Process Cuts Solar Cell Costs (Revised) (Fact Sheet), The Spectrum of Clean Energy Innovation, NREL (National Renewable Energy Laboratory) - 50063.pdf
2:LINK:"http://citeseerx.ist.psu.edu/viewdoc/download?doi=10.1.1.1028.556&rep=rep1&type=pdf"
Abstract:Comparision among Silicon oxide,titanium oxide and Pure Sillicon as ARC in Etching Process
Conclusion:Sillicon oxide is the best ARC,which enhanced 20.6% in short circuit current,decreasing reflection,thus improving efficiency.
Reference:Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell
Author:A. Ibrahim, A.A. El Amin

Revision as of 06:28, 19 January 2017

1:LINK:"http://www.nrel.gov/docs/fy11osti/50063.pdf"

Abstract:Reasons for choosing Etching process

Reference:Award-Winning Etching Process Cuts Solar Cell Costs (Revised) (Fact Sheet), The Spectrum of Clean Energy Innovation, NREL (National Renewable Energy Laboratory) - 50063.pdf

2:LINK:"http://citeseerx.ist.psu.edu/viewdoc/download?doi=10.1.1.1028.556&rep=rep1&type=pdf"

Abstract:Comparision among Silicon oxide,titanium oxide and Pure Sillicon as ARC in Etching Process

Conclusion:Sillicon oxide is the best ARC,which enhanced 20.6% in short circuit current,decreasing reflection,thus improving efficiency.

Reference:Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell Author:A. Ibrahim, A.A. El Amin

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