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LINK:"http://www.nrel.gov/docs/fy11osti/50063.pdf" | 1:LINK:"http://www.nrel.gov/docs/fy11osti/50063.pdf" | ||
Abstract:Reasons for choosing Etching process | Abstract:Reasons for choosing Etching process | ||
Reference:Award-Winning Etching Process Cuts Solar Cell Costs (Revised) (Fact Sheet), The Spectrum of Clean Energy Innovation, NREL (National Renewable Energy Laboratory) - 50063.pdf | |||
2:LINK:"http://citeseerx.ist.psu.edu/viewdoc/download?doi=10.1.1.1028.556&rep=rep1&type=pdf" | |||
Abstract:Comparision among Silicon oxide,titanium oxide and Pure Sillicon as ARC in Etching Process | |||
Conclusion:Sillicon oxide is the best ARC,which enhanced 20.6% in short circuit current,decreasing reflection,thus improving efficiency. | |||
Reference:Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell | |||
Author:A. Ibrahim, A.A. El Amin |
Revision as of 06:28, 19 January 2017
1:LINK:"http://www.nrel.gov/docs/fy11osti/50063.pdf"
Abstract:Reasons for choosing Etching process
Reference:Award-Winning Etching Process Cuts Solar Cell Costs (Revised) (Fact Sheet), The Spectrum of Clean Energy Innovation, NREL (National Renewable Energy Laboratory) - 50063.pdf
2:LINK:"http://citeseerx.ist.psu.edu/viewdoc/download?doi=10.1.1.1028.556&rep=rep1&type=pdf"
Abstract:Comparision among Silicon oxide,titanium oxide and Pure Sillicon as ARC in Etching Process
Conclusion:Sillicon oxide is the best ARC,which enhanced 20.6% in short circuit current,decreasing reflection,thus improving efficiency.
Reference:Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell Author:A. Ibrahim, A.A. El Amin