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===[https://en.wikipedia.org/wiki/Isopropyl_alcohol propan-2-ol]=== | ===[https://en.wikipedia.org/wiki/Isopropyl_alcohol propan-2-ol]=== | ||
Apply to slide, dry with nitrogen gas (if possible ultrasonically clean in solution). | Apply to slide, dry with nitrogen gas (if possible ultrasonically clean in solution). | ||
=== | === <ref> J.J Cras, C.A Rowe-Taitt, D.A Nivens, F.S Ligler. "Comparison of chemical cleaning methods of glass in preparation for salinization," Biosensors and Bioelectronics, vol.14, No. 8-9, pp.683-688, Dec 1999 </ref> === | ||
Dip slide | Dip slide in 1:1 MeOH:Hcl for 30 minutes, then rinse in DI water, and dry under Nitrogen gas. | ||
===[https://en.wikipedia.org/wiki/Plasma_etching oxygen etching]=== | ===[https://en.wikipedia.org/wiki/Plasma_etching oxygen etching]=== | ||
Follow proper protocol for device used | Follow proper protocol for device used |
Revision as of 18:34, 14 July 2016
Glass Substrate Cleaning
Purpose
Glass substrates are used in many laboratory settings. Clean slides prevent contamination of the sample allow for correct deposition of materials. The primary function of this method is to provide a strategy to remove everything from a glass substrate surface. This would effectively make the used slides function as if they were new slides.
Methodology
Method 1 (For cleaned substrates with higher tolerances)
=acetone
Pour Acetone in a container and warm it up on a hot plate (not exceeding 55 deg C)
Place glass substrate in warm Acetone for 10 minutes
Place glass substrate in methanol for 2-5 minutes
Remove and rinse in DI water, then blow dry with nitrogen gas (if possible ultrasonically clean in solution)
propan-2-ol
Apply to slide, dry with nitrogen gas (if possible ultrasonically clean in solution).
Deionized Water
Apply to slide, dry with nitrogen gas (if possible ultrasonically clean in solution).
Each solution can be made into a heated bath to improve the cleaning effect.
Method 2 (For cleaned substrates with tighter tolerances)
alkaline solution(dawn dish soap)
Apply to slide, rub with paper towel and rinse off. (if possible ultrasonically clean in solution).
acetone [1]
Apply to slide, dry with nitrogen gas (if possible ultrasonically clean in solution).
propan-2-ol
Apply to slide, dry with nitrogen gas (if possible ultrasonically clean in solution).
[2]
Dip slide in 1:1 MeOH:Hcl for 30 minutes, then rinse in DI water, and dry under Nitrogen gas.
oxygen etching
Follow proper protocol for device used
Applications
- General substrate control.
- Micro-scale cleaning