(Created page with "{{MOST}} {{Pearce-pubs}} right ==Source== * 1. Chenlong Zhang, Sandra Cvetanovic, Joshua M. Pearce. [https://doi.org/10.1016/j.mex.2017.07.001 Fabricat...")
 
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*[[Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices]]
*[[Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices]]
*[[Advances in plasmonic light trapping in thin-film solar photovoltaic devices]]
*[[Advances in plasmonic light trapping in thin-film solar photovoltaic devices]]
* [[Controlling optical absorption in metamaterial absorbers for plasmonic solar cells]]
*[[Controlling optical absorption in metamaterial absorbers for plasmonic solar cells]]
*[[Plasmonic Perfect Meta-Absobers for a-Si PV Devices]]
*[[Plasmonic Perfect Meta-Absobers for a-Si PV Devices]]
*[[Optical modelling of thin film microstructures literature review]]
*[[Multi-resonant silver nano-disk patterned thin film hydrogenated amorphous silicon solar cells for Staebler-Wronski effect compensation]]
*[[Multi-resonant silver nano-disk patterned thin film hydrogenated amorphous silicon solar cells for Staebler-Wronski effect compensation]]
*[[Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films]]
*[[A novel synthesis of tin oxide thin films by the sol-gel process for optoelectronic applications]]
* [[Enhancement of hydrogenated amorphous silicon solar cells with front-surface hexagonal plasmonic arrays from nanoscale lithography]]
* [[Enhancement of hydrogenated amorphous silicon solar cells with front-surface hexagonal plasmonic arrays from nanoscale lithography]]



Revision as of 10:37, 20 July 2017

Nanolith.jpg

Source


Abstract

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Recent advances in the use of plasmonic metamaterials to improve absorption of light in thin-film solar photovoltaic devices has created a demand for a scalable method of patterning large areas with metal nanostructures deposited in an ordered array. This article describes two methods of fabricating ordered 2D nanosphere colloidal films: spin coating and interface coating. The two methods are compared and parameter optimization discussed. The study reveals that:

  • For smaller nanosphere sizes, spin coating is more favorable, while for larger nanospheres, the angled interface coating provides more coverage and uniformity.
  • A surfactant-free approach for interface coating is developed to fabricate zero-contamination colloidal films.
  • Each of the methods reaches an overall coverage of more than 90% and can be used for nanosphere lithography to form plasmonic metamaterials.

Methods

Detailed methods in the paper - also supported by:

See Also

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