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==Source== | ==Source== | ||
* Ştefan Ţălu, Slawomir Kulesza, Miroslaw Bramowicz, Adam M. Pringle, Joshua M. Pearce, M. Marikkannan, V. Vishnukanthang, J. Mayandi. [https://doi.org/10.1016/j.matlet.2018.03.005 Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations]. ''Materials Express''. doi:10.1016/j.matlet.2018.03.005 [open access] | * Ştefan Ţălu, Slawomir Kulesza, Miroslaw Bramowicz, Adam M. Pringle, Joshua M. Pearce, M. Marikkannan, V. Vishnukanthang, J. Mayandi. [https://doi.org/10.1016/j.matlet.2018.03.005 Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations]. ''Materials Express''. 220 (2018), 169–171. doi:10.1016/j.matlet.2018.03.005 [https://www.academia.edu/36214749/Micromorphology_analysis_of_sputtered_indium_tin_oxide_fabricated_with_variable_ambient_combinations open access preprint] | ||
==Highlights== | ==Highlights== |
Revision as of 05:07, 21 March 2018
Source
- Ştefan Ţălu, Slawomir Kulesza, Miroslaw Bramowicz, Adam M. Pringle, Joshua M. Pearce, M. Marikkannan, V. Vishnukanthang, J. Mayandi. Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations. Materials Express. 220 (2018), 169–171. doi:10.1016/j.matlet.2018.03.005 open access preprint
Highlights
- Indium-tin oxide (ITO) thin films fabricated by DC magnetron sputtering method.
- ITO films prepared under different mixed sputtering ambient.
- Three-dimensional (3-D) micromorphology analysis of sputtered ITO thin films.
- Fractal geometry analyzed by areal autocorrelation function and pseudo-topothesy K.
- Influence of sputtering ambient on 3-D micromorphology correlated.
Abstract
This study experimentally investigates the fractal nature of the DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.
Keywords
Indium-tin oxide thin film; different sputtering ambient; atomic force microscopy; fractal analysis; and surface topography
See also
- Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films
- Advances in plasmonic light trapping in thin-film solar photovoltaic devices
- Plasmonic Perfect Meta-Absobers for a-Si PV Devices
- Limitations of ultra-thin transparent conducting oxides for integration into plasmonic-enhanced thin-film solar photovoltaic devices
- Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices
- Optical modelling of thin film microstructures literature review
- Multi-resonant silver nano-disk patterned thin film hydrogenated amorphous silicon solar cells for Staebler-Wronski effect compensation
- A new method of preparing highly conductive ultra-thin indium tin oxide for plasmonic-enhanced thin film solar photovoltaic devices
- Ambiance-dependent Agglomeration and Surface-enhanced Raman Spectroscopy Response of Self-assembled Silver Nano-particles for Plasmonic Photovoltaic Devices