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Gallium arsenide (GaAs) is a semiconductor material that is used in a wide variety of applications ranging from circuits to solar cells.  GaAs is most useful for solar cell applications in a thin film form, which can be obtained in several ways.
 
Gallium arsenide (GaAs) is a semiconductor material that is used in a wide variety of applications ranging from circuits to solar cells.  GaAs is most useful for solar cell applications in a thin film form, which can be obtained in several ways.
  
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Thin films of GaAs can be produced using both bulk and epitaxial growth.
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Bulk Growth
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There are two common ways to produce GaAs using bulk growth, Liquid-Encapsulated Czochralski (LEC) growth, and Vertical Gradient Freeze (VGF) technology.
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LEC growth is accomplished by melting high-purity arsenic and gallium in a temperature vessel, and slowly cooling to produce a single crystal.  The GaAs crystal produced using this method however has some impurities such as significant levels of carbon, and numerous dislocations.  These impurities cause the semiconductor to be unusable for some applications.
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VGF technology
  
 
The most common ways of producing GaAs films are Vapour Phase Epitaxy (VPE), Metalorganic Chemical Vapour Deposition (MOCVD), and Molecular Beam Epitaxy (MBE).
 
The most common ways of producing GaAs films are Vapour Phase Epitaxy (VPE), Metalorganic Chemical Vapour Deposition (MOCVD), and Molecular Beam Epitaxy (MBE).

Revision as of 16:58, 21 September 2011

Gallium arsenide (GaAs) is a semiconductor material that is used in a wide variety of applications ranging from circuits to solar cells. GaAs is most useful for solar cell applications in a thin film form, which can be obtained in several ways.

Thin films of GaAs can be produced using both bulk and epitaxial growth.

Bulk Growth

There are two common ways to produce GaAs using bulk growth, Liquid-Encapsulated Czochralski (LEC) growth, and Vertical Gradient Freeze (VGF) technology.

LEC growth is accomplished by melting high-purity arsenic and gallium in a temperature vessel, and slowly cooling to produce a single crystal. The GaAs crystal produced using this method however has some impurities such as significant levels of carbon, and numerous dislocations. These impurities cause the semiconductor to be unusable for some applications.

VGF technology

The most common ways of producing GaAs films are Vapour Phase Epitaxy (VPE), Metalorganic Chemical Vapour Deposition (MOCVD), and Molecular Beam Epitaxy (MBE).


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