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{{wikipedia}}
{{wikipedia}}Molecular Beam Epitaxy (MBE) is a material production process used to produce high-purity nano-scale materials.  A material is grown through interactions between a substrate and one or more beams of atoms or molecules incident upon the substrate's surface.  MBE exhibits many advantages over similar thin film deposition processes: significantly improved purity, arbitrarily sharp deposition resolution, and operation at low temperatures.
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{{MECH370}}
[[gallium arsenide solar cells]]
== Introduction ==
* Image of atomic deposition
== System Description ==
* Insert Image of MBE layout.
* discussion of non-equilibrium state
===Substrate Stage===
* heating, purpose, rotation, function
===Effusion Cells===
* Thermodynamics (surface interactions, necessity for UHV)
====Shuttering====
* How it works and why it is so useful!
 
== Sample Interaction ==
* Discussion of a sample material produced via MBE and what happens? (may be too inorganic chemistry-oriented)
 
== Efficiency Considerations ==
* degass cleaning?  time...?
* effect of chemistry-related changes on outcome (Al on GaAs thing, N stuff, etc.)
* Temperature considerations
== Applications ==
 
=== Semiconductors ===
* Sharp doping profiles
==== Heterojunctions ====
* Applications in photovoltaic cells
==== Optoelectronics ====
* Lasers!  LEDs!  Digital Cameras!  DVDs!  (Check out HD stuff (BluRay, etc.))
=== Superconductors ===


[[Category:Electricity]]
[[Category:Energy]]
[[Category:Materials processing]]
[[Category:Materials processing]]
[[Category:Nanotechnology]]
[[Category:Nanotechnology]]

Revision as of 06:45, 12 November 2008

Template:WikipediaMolecular Beam Epitaxy (MBE) is a material production process used to produce high-purity nano-scale materials. A material is grown through interactions between a substrate and one or more beams of atoms or molecules incident upon the substrate's surface. MBE exhibits many advantages over similar thin film deposition processes: significantly improved purity, arbitrarily sharp deposition resolution, and operation at low temperatures. Template:MECH370

Introduction

  • Image of atomic deposition

System Description

  • Insert Image of MBE layout.
  • discussion of non-equilibrium state

Substrate Stage

  • heating, purpose, rotation, function

Effusion Cells

  • Thermodynamics (surface interactions, necessity for UHV)

Shuttering

  • How it works and why it is so useful!

Sample Interaction

  • Discussion of a sample material produced via MBE and what happens? (may be too inorganic chemistry-oriented)

Efficiency Considerations

  • degass cleaning? time...?
  • effect of chemistry-related changes on outcome (Al on GaAs thing, N stuff, etc.)
  • Temperature considerations

Applications

Semiconductors

  • Sharp doping profiles

Heterojunctions

  • Applications in photovoltaic cells

Optoelectronics

  • Lasers! LEDs! Digital Cameras! DVDs! (Check out HD stuff (BluRay, etc.))

Superconductors

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