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# Reduce the substrate temperature to ''700<sup>o</sup>C'' | # Reduce the substrate temperature to ''700<sup>o</sup>C'' | ||
# Remove the QCM | # Remove the QCM | ||
# Deposit 10 secs of Al on the Si substrate and move substrate from 135<sup>o</sup> to 295<sup>o</sup>) | |||
# Deposit | |||
# Start the plasmatron (see pg. 4, Running the Plasmatron) | # Start the plasmatron (see pg. 4, Running the Plasmatron) | ||
# Start the RHEED (see pg. 8, RHEED System Warmup) | # Start the RHEED (see pg. 8, RHEED System Warmup) |