{"id":49291,"key":"E-beam_Deposition_protocol:_MOST","title":"E-beam Deposition protocol: MOST","latest":{"id":1209326,"timestamp":"2025-11-28T02:03:56Z"},"content_model":"wikitext","license":{"url":"https://www.appropedia.org/Appropedia:Copyrights","title":"CC-BY-SA-4.0"},"source":"=== !!This page is under construction!! ===\n\n{{MOST}}\n\nElectron-beam (e-beam) thin-film deposition can be broadly classified as either physical vapor deposition (PVD) or chemical vapor deposition (CVD) method. With PVD, deposition rates are generally lower and the process is carried out at low substrate temperatures. CVD is a high temperature process and deposition rates higher than those characteristic of PVD can be achieved.\n\n== Background on E-beam deposition ==\n\n== Equipment ==\n\n{| class=\"wikitable\" style=\"width:300px; float:right; margin:.5em\"\n! E-Beam Model Frederick\n|-\n! [[File:E-Beam Model Frederick.jpg|thumb|center|upright=1.50|Fig.1.|]]\n|}\n\n=== E-Beam Deposition Frederick Specifications ===\n\n'''Hardware Description'''\n\n=== Electron Beam (E-Beam) Evaporation System Operating Procedure and General Information ===\n\nMicrofabrication Facility Michigan Tech\nBill Knudsen, Director, wknudsen@mtu.edu\n\n== Load Sample(s) ==\n\n# \tThe chamber should be pumped down when you arrive. If not, contact Bill.\n# \tTo open the chamber:\n\na)\tClose the Gate Valve and wait for ~10 seconds.\n\nb)\tOpen the Vent Valve and wait for A to level off (usually somewhere around 7.6 +2).\n\nc)\tClose the Vent Valve and wait for ~5 seconds.\n\nd)\tPress Lift (green button) to open the lid of the chamber.\n\n# \tAfter the chamber is open:\n\na)\tPut on gloves and lift the sample holder (metal circle) out of the scaffold.\n\nb)\tUse an Allen Wrench to loosen the screws and clamps.\n\nc)\tSlide your sample (side to have film facing \"up\") under one of the clamps. Use the Allen Wrench to tighten the clamp to the sample. Be careful not to clamp too tightly if your sample is brittle! NOTE: Only the part of your sample exposed (outside of the clamp) will have a film after the evaporation is completed.\n\nd)\tAdd film material (Al, In, Cr, or Au) to the crucible, if necessary.\n\ne)\tMake sure the evaporation chamber is located at the specified film material.\n\nf)\tCheck to see that the Shutter is closed. If the shutter is not closed, press in the shutter knob and turn to the \"close\" position. Make sure it is completely closed before the sample is loaded.\n\ng)\tPlace the sample holder (sample facing \"down\") back in the scaffold.\n\n# \tTo close the chamber:\n\na)\tPress Motor Down (green button) to lower the lid of the chamber.\n\nb)\tOnce the lid is closed, make sure it is centered on top of the chamber. The lid can be adjusted manually if it is not centered.\n\nc)\tOpen the viewing window to check if the plastic was coated by the last user. The plastic must be transparent in order to run the evaporation successfully. Close the viewing window after check and/or replacement.\n\n# \tSet vacuum environment:\n\na)\tDo NOT set vacuum until the lid and viewing window are closed!\nb)\tOpen Roughing Valve until A reaches 3 -2.\nc)\tClose Roughing Valve and wait for ~5 seconds.\nd)\tOpen Gate Valve and wait ~1 day.\n\n== Evaporate Film ==\n\n# \tTurn IG2 Button off.\n# \tTurn High Voltage (Control Panel) on with tweezers. The kV will increase. Amps will stay the same.\n# \tUsing the unit next to the chamber, increase the Current with the dial.\n# \tOnce the spot is visible in the chamber, use the X and Y sliders on the unit to adjust the beam to the center of the crucible.\n# \tIncrease the current until a purple glow appears above the crucible. The crucible will also likely be red hot when the glow is apparent. You are ready to evaporate—get a stopwatch!\n# \tOpen the Shutter by pressing in the shutter knob and turning to \"open\".\n# \tBegin timing and wait for the desired time to elapse.\n# \tDecrease Current to \"0\".\n# \tTurn off High Voltage by pressing the \"OFF\" button (Control Panel).\n\n10.\tClose the Shutter by pressing in the shutter knob and turning to \"close\".\n\n11.\tTo retrieve the sample, open the chamber. (See Load Sample, Step 2.)\n\n== Shut Down ==\n\n# \tLoad the new sample (or leave the sample holder empty) and follow the Load Sample section, Steps 1-5 (above).\n# \tMake sure the vacuum is set properly before you leave.\n# \tLog the information into the logbook.\n# \tClean the work area.\n\nIf you have any problems or questions, contact Bill.\n\n== General Information ==\n\nEach film material behaves differently in the evaporation system. Trials have been completed to plot film thickness as a function of time for aluminum.\n\nThe y-error bars indicate all of the data falls within the required range for a linear trend. The linear trend is further justified when thickness is plotted on a logarithmic scale.\n\nThe raw and averaged data are:\n\nTime (s)\nThickness (nm)\n0\t0\n12\t16.657\n12\t12.665\n12\t12.734\n58\t208.62\n58\t193.82\n58\t202.98\n58\t194.93\n60\t202.23\n60\t201.43\n60\t223.82\n60\t218.2\n120\t2340\n120\t4198\n120\t3614\n300\t4130\n300\t5720\n600\t14000\n\nTime (s)\tAverage Thickness (nm)\n12\t14.019\n58\t201.8067\n60\t211.42\n120\t3384\n300\t4925\n600\t14000\n\nThe film thicknesses were measured on the FE-SEM (thick films) or AFM (thin films).\n\n{{Page data\n| license = CC-BY-SA-3.0\n| description = Electron beam deposition enables thin-film tech. Appropedia explains the tools and steps behind this process in clean energy fields.\n}}\n\n[[Category:MOST methods]]\n[[Category:Jephias Gwamuri Thesis]]"}