Photovoltaic Literature Reviews
|Michigan Tech's Open Sustainability Technology Lab.
Wanted: Students to make a distributed future with solar-powered open-source 3-D printing and recycling.
Abstract:Reasons for choosing Etching process
Reference:Award-Winning Etching Process Cuts Solar Cell Costs (Revised) (Fact Sheet), The Spectrum of Clean Energy Innovation, NREL (National Renewable Energy Laboratory) - 50063.pdf
Abstract:Comparision among Silicon oxide,titanium oxide and Pure Sillicon as ARC in Etching Process
Conclusion:Sillicon oxide is the best ARC,which enhanced 20.6% in short circuit current,decreasing reflection,thus improving efficiency.
Reference:Etching, Evaporated Contacts and Antireflection Coating on Multicrystalline Silicon Solar Cell Author:A. Ibrahim, A.A. El Amin
---etching by means of reactive ion etching with SF6, or CHF3,/SF6,. ---Two type of ARC used:
(A)Graphaite Covered with conducting Sic,the graphite acts as base contact of the cells. (B) Graphite encapsulated with insulating Sic- and Si02/SiN/Si02-layers (ONO) leads to solar cells on insulating foreign substrates in Method B,the efficiency was improved by 11%:
future scope:same experiment using wet processing
Reference:Ludemann, R., Schaefer, S., Schule, C. and Hebling, C., 1997, January. Dry processing of mc-silicon thin-film solar cells on foreign substrates leading to 11% efficiency. In Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE (pp. 159-162). IEEE.
Description:For normally incident light falling upon periodic textures, angles of 45° ensure double-bounce reflectances will occur; angles of 60° yield triple-bounce reflectances at least. As facet tilt angles decrease below a , 45°, less and less light will receive double-bounce incidence, closer to the base of the grooves, until at angles below 30°, no light will receive multiple bounce incidence in air, and reflectance levels are equivalent to that of polished silicon
references: Alkaline Etching for Reflectance Reduction in Multicrystalline Silicon Solar Cells J. D. Hylton,z A. R. Burgers, and W. C. Sinke
Reference:Effect of Ag Particle Size in Thick-Film Ag Paste on the Electrical and Physical Properties of Screen Printed Contacts and Silicon Solar Cells Mohamed M. Hilali,a Kenta Nakayashiki,a Chandra Khadilkar,b Robert C. Reedy,c Ajeet Rohatgi,a Aziz Shaikh,d Steve Kim,d and Srinivasan Sridharanb
Result:Small to medium Ag particles reduce the series resistance,higher shunt resistance,decrease the leakage current and improve the fill factor Thus improving the efficiency by 17.4%
Reference:Anti-reflective coatings: A critical, in-depth review Hemant Kumar Raut,Anand Ganesh,Sreekumaran Nairb and Seeram Ramakrishna
description:abour ARC in daily life,advantage of ARC in Solar cell
you can read it for your knowledge..
Reference:ZnO Nanostructures as Efficient Antireflection Layers in Solar Cells Yun-Ju Lee,* Douglas S. Ruby, David W. Peters, Bonnie B. McKenzie, and Julia W. P. Hsu
description: between SiN and ZnO,Zno acts as better ARC
future scope:we may further improve ARC performance by tailoring the thickness of the bottom fused ZnO layer and through better control of tip tapering.
Reference:Pyramidal texturing of silicon solar cell with TMAH chemical anisotropic etching by P. Papet, O. Nichiporuk, Kaminski, Y. Rozier, J. Kraiem,J.-F. Lelievre, A. Chaumartin, A. Fave, M. Lemiti
finding:here TAMH is compared among NaOH and KOH. by using TMAH pyramidal texture and SiNx:H ARC, 2.7% less reflectance is obtained
Result:TMAH pyramidal texture and SiNx:H ARC is substituted traditional Alkaline solution.so now it is used in front surface to reduce reflectance and to improve light trapping.
Reference:Texture etched ZnO:Al coated glass substrates for silicon based thin Ælm solar cells O. Kluth, B. Rech, L. Houben, S. Wieder, G. Scho,C. Beneking,H. Wagner,A.Lo,H.W. Schock
description:here,the substrate is etched with HCL solution and in the DC and RF sputtering on glass substrates from ceramic (ZnO:(Al)2(O)3 and metallic (Zn:Al) targets respectively,then it is compared with electro-opto properties of smooth ZnO substrate.
result:by this,separate optimization of the electro-optical and light scattering properties was done.resistivity decreased,reflection loss decreased,and transmitting capacity increased
future scope:he light scattering properties of suitable Films can be controlled over a wide range simply by varying the etching time. Moreover, the electrical properties are not affected by the etching process. Thus, within certain limits a separate optimiza-tion of the electro-optical and light scattering properties is possible.
Reference:Enhanced Conversion Efficiencies of Cu2ZnSnS4-Based Thin Film Solar Cells by Using Preferential Etching Technique Hironori Katagiri, Kazuo Jimbo, Satoru Yamada, Tsuyoshi Kamimura, Win Shwe Maw, Tatsuo Fukano1� , Tadashi Ito1, and Tomoyoshi Motohiro1
description:Cu2ZnSnS4 (CZTS) is deposited in Rf sputtering in Mo coated Sodium Lime glass and then etched by deionized water for 10min and then a buffer layer of Cds is deposited ...then the sampled is checked for electro optical parameters and found that deionised water etched sample has 18% better conversion efficiency.
Reference:Photovoltaic performance of c-Si wafer reclaimed from end-of-life solar cell using various mixing ratios of HF and HNO3 Jun-Kyu Leea,c, Jin-Seok Leea,⁎, Young-Soo Ahna, Gi-Hwan Kangb, Hee-Eun Songb,Jeong-In Leeb, Min-Gu Kangb, Churl-Hee Choc,
Description:by mixing in ratio 83:17 of HF and HNO3 the the conversion efficiency of solar cell increased by 18.9% which is 17.6% of original
Reference:Improved stability of CdTe solar cells by absorber surface etching Ivan Rimmaudoa,1, Andrei Salaveia,2, Elisa Artegiania, Daniele Menossia, Marco Giarolab,Gino Mariottob, Andrea Gasparottoc,Alessandro Romeoa,description:different reasons for degradation of CdTe solar cell investigated and new methods are proposed
finding:it is found that in presence of Cu,its diffusion into CdTe Surface decreases the solar cell performance.So 40s Br-MeOh etching and 2 nm of Cu deposited on top of it.Now the diffusion rate decreased drastically and thus cell performance improved.and now the new sample is more stabe than the previous one..
Description:Alkali solutions are not suitable to etch due to anisotropic etching.So here a a two step etching process is developed to obtain a flast surface.so now a sodium hydroxide solution,followed by a sodium hydroxide-sodium hypochlorite solution etching is done.
finding:here we removed the isotropically damaged layer by this etching process and improvement in short circuit current and open circuit voltage thus efficiency is improved..
Reference:Pre-texturing multi-crystalline silicon wafer via a two-step alkali etching method to achieve efficient nanostructured solar cells Fenqin Hua, b, Yun Suna, b, Jiawei Zhaa, b, Kexun Chena, b, Shuai Zoua, b, Liang Fanga, b, , , Xiaodong Su
Refernce:Garcia-Llamas, E., Merino, J.M., Gunder, R., Neldner, K., Greiner, D., Steigert, A., Giraldo, S., Izquierdo-Roca, V., Saucedo, E., León, M. and Schorr, S., 2017. Cu 2 ZnSnS 4 thin film solar cells grown by fast thermal evaporation and thermal treatment. Solar Energy, 141, pp.236-241.
description:CZTS solar cells fabricated by a rapid thermal evaporation of Curich kesterite powder followed by annealing under Ar atmosphere.with slower heating better diffusion of elements observed.here first the absorbed layer is etched with (NH 4) 2 S and and before depositng the buffer layer the sample is etched with KCN.it removed the possible oxides deposited on the sample,and finnally improving the efficeincy.
Reference:Tao, Y., Madani, K., Cho, E., Rounsaville, B., Upadhyaya, V. and Rohatgi, A., 2017. High-efficiency selective boron emitter formed by wet chemical etch-back for n-type screen-printed Si solar cells. Applied Physics Letters, 110(2), p.021101.
description:Selective boron emiiter formed by wet chemical etch back by using a solution of HF/HNO3/H2O volume ratio (3:2:15).so to increase the rate of reaction NaNO2 is used which produces Porous sillicon. To make the surface less pyramidal it is again etched with KOH solution and after a high temperature oxidation above 1000 �C and subsequent SiO2 removal in diluted HF (5%) solution, the pyramid surface becomes smooth.This results a higher open circuit volatage which improves the efficiency of front junction to 21.04%