Information for "Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films"

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Display titleEffect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films
Default sort keyEffect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films
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Page creatorJ.M.Pearce (talk | Contributions)
Date of page creation11:18, 23 January 2015
Latest editorJ.M.Pearce (talk | Contributions)
Date of latest edit00:57, 20 December 2018
Total number of edits9
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