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[[Category:MSE5621-2020]] | [[Category:MSE5621-2020]] | ||
===Literature review for open source hardware project on Mask Aligner=== | ===Literature review for open source hardware project on Mask Aligner=== | ||
=Background= | |||
'''Searches''' | |||
*Google search for Mask Aligner | |||
==Mask Aligner/Aligner== | |||
From Wikipedia:[https://en.wikipedia.org/wiki/Aligner] | |||
*"An aligner, or mask aligner, is a system that produces integrated circuits (IC) using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the mask and onto the photoresist. The "alignment" refers to the ability to place the mask over precisely the same location repeatedly as the chip goes through multiple rounds of lithography." | |||
==List of References== | |||
* https://arxiv.org/ftp/arxiv/papers/1802/1802.07815.pdf | |||
* https://web.wpi.edu/Pubs/E-project/Available/E-project-042519-124541/unrestricted/Klimkiewicz_MQP.pdf |
Revision as of 05:45, 15 September 2020
Literature review for open source hardware project on Mask Aligner
Background
Searches
- Google search for Mask Aligner
Mask Aligner/Aligner
From Wikipedia:[1]
- "An aligner, or mask aligner, is a system that produces integrated circuits (IC) using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the mask and onto the photoresist. The "alignment" refers to the ability to place the mask over precisely the same location repeatedly as the chip goes through multiple rounds of lithography."