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Figures of Merit for GaN substrates

Bulk Type Property Units Characterization Method Industry range Goal Reference/hyperlink
GaN Freestanding Substrate Bandgap
eV
PL
3.44


Electron mobility
cm2/V s

1350(300K)


Hole mobility
cm2/V s

13(300K)


Melting point
K
thermal couple
2573


Lattice constants
nm
X-ray diffraction
a=0.319;c=0.518


Thermal conductivity
W/cm K

2.1


Heat capacity
J/mol K

35.3


Elastic modulus
GPa

210


Dislocation density
/cm2

≤5 x 106


Sheet carrier density
/cm2

NA


Sheet resistance/Resistivity
ohm-cm

0.1-1(Undoped)


<0.01(N type)

>106(Semi insulating)

Doping concentration
/cm3

~1019(N type)


N/A(P type)

Thickness
um

200-475(N type)


475(Semi insulating)

Misorientation
deg

On demand


Macro defect density
/cm2

A grade<=2; B grade>2


Bow
um

<5


Total thickness variation (TTV)
um

<10


RMS roughness
nm

210


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