Articles[edit | edit source]
Keywords[edit | edit source]
Google scholar[edit | edit source]
- electropolishing
- copper electropolish
- copper electropolishing phosphoric acid
Articles[edit | edit source]
M. Datta and D. Landolt, “Fundamental aspects and applications of electrochemical microfabrication,” Electrochimica Acta, vol. 45, no. 15–16, pp. 2535–2558, 2000.[edit | edit source]
- History: started 50yrs ago
- e.polish = anodic w/ dissolution & leveling & brightening (anode = working)
- primary & secondary current distribution -> Wagner's law
- Uniformity -> anode-cathode distance or additives
- Current density = major factor -> geometry
D. Landolt, “Fundamental aspects of electropolishing,” Electrochim. Acta, vol. 32, no. 1, pp. 1–11, 1987.[edit | edit source]
- Levelling & brightening (> 1um, < 1um, think of visible light)
- Transport limiting -> microsmoothing
- Two mass transport mechanisms, dissolution limited & acceptor limited
- Limiting-current density
D. Landolt, P. F. Chauvy, and O. Zinger, “Electrochemical micromachining, polishing and surface structuring of metals: Fundamental aspects and new developments,” Electrochim. Acta, vol. 48, no. 20–22, pp. 3185–3201, 2003.[edit | edit source]
- Pitting vs brightening
- Oxide layer -> unstable -> polishing (high voltage usually) (contradiction to later?)
- Initial phase charge small vs total charge -> good polish (high voltage...)
J. B. Mathieu, “Electropolishing of Titanium in Perchloric Acid-Acetic Acid Solution,” J. Electrochem. Soc., vol. 125, no. 7, p. 1044, 1978.[edit | edit source]
- Anode potential vs oxide layer thickness
- Breakdown -> polishing (contradiction to later?)
R. Vidal and a C. West, “Copper Electropolishing in Concentrated Phosphoric-Acid .1. Experimental Findings,” J. Electrochem. Soc., vol. 142, no. 8, pp. 2682–2689, 1995.[edit | edit source]
- Good quick history
- Rotating electrode -> larger limiting current -> theory (Tribollet & Newman)
R. Vidal and a C. West, “Copper Electropolishing in Concentrated Phosphoric-Acid .1. Experimental Findings,” J. Electrochem. Soc., vol. 142, no. 8, pp. 2682–2689, 1995.[edit | edit source]
- Current limiting region
- Potential surge after a while -> bad
- Too low current density -> no boundary layer
- Good schematic...
D. Landolt, P. F. Chauvy, and O. Zinger, “Electrochemical micromachining, polishing and surface structuring of metals: Fundamental aspects and new developments,” Electrochim. Acta, vol. 48, no. 20–22, pp. 3185–3201, 2003.[edit | edit source]
- Loooots of stuff (and new!)
- CV curve w/ etching, passivation layer, polishing, pitting...
- Copper EP electrolytes w/ current & voltage ranges
- Diffusion dominated -> agitation (rotation) makes this better -> higher limiting current
- Theoretical stuff: resistance, diffusion phenomenon, acceptor theory, passivation, ionic absorption
- Applications
