215
edits
Changes
Jump to navigation
Jump to search
Line 52:
Line 52: − + + + +
→Creation
=====Electrochemical Deposition=====
=====Electrochemical Deposition=====
When a metallic salt is dissolved in solution, the metal (positive) cation breaks apart from its (negative) anion counterpart. With positive and negative ions in solution, many interesting things can occur when an electric current is routed through said solution. Originally this process was designed to create thin layers of a specific metal. Recently, however, this process has been slightly augmented to create conducting and semi-conducting nanowires. The basic premise behind electrochemical deposition or [[electroplating]], is to negatively charge a substrate and then immerse it in the solution of choice. The negative charge on the electrode (or substrate) attracts the positive metal ions in solution. This causes the metal ions to lie n the surface of the substrate creating a thin layer. This layer usually is about 100 nanometers in thickness; however, the this property can be changed by altering certain factors in the film's creations such as, voltage, solution constituents, temperature and so on.
When a metallic salt is dissolved in solution, the metal (positive) cation breaks apart from its (negative) anion counterpart. With positive and negative ions in solution, many interesting things can occur when an electric current is routed through said solution. Originally this process was designed to create thin layers of a specific metal. Recently, however, this process has been slightly augmented to create conducting and semi-conducting nanowires. The basic premise behind electrochemical deposition or [[electroplating]], is to negatively charge a substrate and then immerse it in the solution of choice. The negative charge on the electrode (or substrate) attracts the positive metal ions in solution. This causes the metal ions to lie n the surface of the substrate creating a thin layer. This layer usually is about 100 nanometers in thickness; however, the this property can be changed by altering certain factors in the film's creations such as, voltage, solution constituents, temperature and so on.
=====Other Means of Creation=====
Without one of these means discussed, creating a [[gallium arsenide]] [[solar cell]] can prove very difficult (especially a high efficiency one). A means is needed to create a this film of [[gallium arsenide]] on the respective [[substrate]]. It is possible that it can be done by [[spin coating]] or very careful application of a [[gallium arsenide paste]] or liquid. This may be made by combining [[gallium arsenide]] powder and varying quantities of water. These means will most likely not be quite as effective as the others discussed because the order of the [[gallium arsenide]] [[crystal]] will not be controlled and pristine.
==Why Nano Gallium Arsenide Solar Cells?==
==Why Nano Gallium Arsenide Solar Cells?==