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{{MOST}}
{{MOST}}


{{Pearce-pubs}}
[[File:Afmmicromorphanalysis.jpg|thumb]]


==Source==
{{Source data
Ştefan Ţălu, Slawomir Kulesza, Miroslaw Bramowicz, Adam M. Pringle, Joshua M. Pearce, M. Marikkannan, V. Vishnukanthang, J. Mayandi. [https://doi.org/10.1016/j.matlet.2018.03.005 Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations]. ''Materials Express''. 220 (2018), 169–171. doi:10.1016/j.matlet.2018.03.005 [open access]
| type = Paper
| cite-as = Ştefan Ţălu, Slawomir Kulesza, Miroslaw Bramowicz, Adam M. Pringle, Joshua M. Pearce, M. Marikkannan, V. Vishnukanthang, J. Mayandi. [https://doi.org/10.1016/j.matlet.2018.03.005 Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations]. ''Materials Express''. 220 (2018), 169–171. doi:10.1016/j.matlet.2018.03.005 [https://www.academia.edu/36214749/Micromorphology_analysis_of_sputtered_indium_tin_oxide_fabricated_with_variable_ambient_combinations open access preprint]
}}


==Highlights==
This study experimentally investigates the fractal nature of the DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.
 
{{Pearce publications notice}}
 
== Highlights ==


* Indium-tin oxide (ITO) thin films fabricated by DC magnetron sputtering method.
* Indium-tin oxide (ITO) thin films fabricated by DC magnetron sputtering method.
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* Influence of sputtering ambient on 3-D micromorphology correlated.
* Influence of sputtering ambient on 3-D micromorphology correlated.


==Abstract==
== Keywords ==
[[image:Afmmicromorphanalysis.jpg|right]]
This study experimentally investigates the fractal nature of the DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.


==Keywords==
  Indium-tin oxide thin film; different sputtering ambient; atomic force microscopy; fractal analysis; and surface topography
  Indium-tin oxide thin film; different sputtering ambient; atomic force microscopy; fractal analysis; and surface topography


==See also==
== See also ==
 
* [[Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films]]
* [[Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films]]
*[[Advances in plasmonic light trapping in thin-film solar photovoltaic devices]]
* [[Advances in plasmonic light trapping in thin-film solar photovoltaic devices]]
*[[Plasmonic Perfect Meta-Absobers for a-Si PV Devices]]
* [[Plasmonic Perfect Meta-Absobers for a-Si PV Devices]]
*[[Limitations of ultra-thin transparent conducting oxides for integration into plasmonic-enhanced thin-film solar photovoltaic devices]]
* [[Limitations of ultra-thin transparent conducting oxides for integration into plasmonic-enhanced thin-film solar photovoltaic devices]]
*[[Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices]]
* [[Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices]]
*[[Optical modelling of thin film microstructures literature review]]
* [[Optical modelling of thin film microstructures literature review]]
*[[Multi-resonant silver nano-disk patterned thin film hydrogenated amorphous silicon solar cells for Staebler-Wronski effect compensation]]
* [[Multi-resonant silver nano-disk patterned thin film hydrogenated amorphous silicon solar cells for Staebler-Wronski effect compensation]]
*[[A new method of preparing highly conductive ultra-thin indium tin oxide for plasmonic-enhanced thin film solar photovoltaic devices]]
* [[A new method of preparing highly conductive ultra-thin indium tin oxide for plasmonic-enhanced thin film solar photovoltaic devices]]
* [[Ambiance-dependent Agglomeration and Surface-enhanced Raman Spectroscopy Response of Self-assembled Silver Nano-particles for Plasmonic Photovoltaic Devices]]
* [[Ambiance-dependent Agglomeration and Surface-enhanced Raman Spectroscopy Response of Self-assembled Silver Nano-particles for Plasmonic Photovoltaic Devices]]
* [[Properties of Al-Doped Zinc Oxide and In-Doped Zinc Oxide Bilayer Transparent Conducting Oxides for Solar Cell Applications]]
{{Page data
| title-tag = Micromorphology Analysis of Sputtered ITO with Variable Ambient
}}


[[Category:MOST completed projects and publications]]
[[Category:MOST completed projects and publications]]
[[Category:Materials processing]]
[[Category:Materials processing]]
[[category:materials science]]
[[Category:materials science]]
[[category:science]]
[[Category:science]]

Latest revision as of 16:01, 23 February 2024

Afmmicromorphanalysis.jpg
FA info icon.svg Angle down icon.svg Source data
Type Paper
Cite as Citation reference for the source document. Ştefan Ţălu, Slawomir Kulesza, Miroslaw Bramowicz, Adam M. Pringle, Joshua M. Pearce, M. Marikkannan, V. Vishnukanthang, J. Mayandi. Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations. Materials Express. 220 (2018), 169–171. doi:10.1016/j.matlet.2018.03.005 open access preprint

This study experimentally investigates the fractal nature of the DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.

Highlights[edit | edit source]

  • Indium-tin oxide (ITO) thin films fabricated by DC magnetron sputtering method.
  • ITO films prepared under different mixed sputtering ambient.
  • Three-dimensional (3-D) micromorphology analysis of sputtered ITO thin films.
  • Fractal geometry analyzed by areal autocorrelation function and pseudo-topothesy K.
  • Influence of sputtering ambient on 3-D micromorphology correlated.

Keywords[edit | edit source]

Indium-tin oxide thin film; different sputtering ambient; atomic force microscopy; fractal analysis; and surface topography

See also[edit | edit source]

FA info icon.svg Angle down icon.svg Page data
Authors Joshua M. Pearce
License CC-BY-SA-3.0
Language English (en)
Related 0 subpages, 12 pages link here
Impact 346 page views
Created March 4, 2018 by Joshua M. Pearce
Modified February 23, 2024 by Maintenance script
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