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Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations
| By Michigan Tech's Open Sustainability Technology Lab.
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Pearce Publications: Energy Conservation • Energy Policy • Industrial Symbiosis • Life Cycle Analysis • Materials Science • Open Source • Photovoltaic Systems • Solar Cells • Sustainable Development • Sustainability Education
- Ştefan Ţălu, Slawomir Kulesza, Miroslaw Bramowicz, Adam M. Pringle, Joshua M. Pearce, M. Marikkannan, V. Vishnukanthang, J. Mayandi. Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations. Materials Express. 220 (2018), 169–171. doi:10.1016/j.matlet.2018.03.005 open access preprint
- Indium-tin oxide (ITO) thin films fabricated by DC magnetron sputtering method.
- ITO films prepared under different mixed sputtering ambient.
- Three-dimensional (3-D) micromorphology analysis of sputtered ITO thin films.
- Fractal geometry analyzed by areal autocorrelation function and pseudo-topothesy K.
- Influence of sputtering ambient on 3-D micromorphology correlated.
This study experimentally investigates the fractal nature of the DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.
Indium-tin oxide thin film; different sputtering ambient; atomic force microscopy; fractal analysis; and surface topography
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