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Chemical resistance of 3D printable polymers: experiments

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Aalto.png This page was part of an Aalto University course 3D Printing of Open Source Hardware for Science

Please leave comments using the discussion tab. The course runs in the Fall semester 2017. It is not open edit.



This page describes the experiments on the chemical resistance of 3D printable FFF thermoplastics. Literature review on the topic is found here.

Experimental[edit]

List of chemicals[edit]

First, the resistance of 3D printable materials at least to the following solvents, acids and solutions is tested:

  • Deionized H2O
  • Isopropanol
  • Acetone
  • Hydrochloric acid (HCl), 37%
  • Ammonia (NH3), aqueous solution 25%
  • Hydrogen peroxide (H2O2), aqueous solution 30%
  • Nitric acid (HNO3)
  • Phosphoric acid (H3PO4)
  • Acetic acid, concentrated

These chemicals are common chemicals used in many laboratories and many semiconductor processing steps, such as in the cleaning of silicon wafers.

Chemical processes[edit]

  • Resist strip
  • RCA1 and RCA2 wafer cleaning processes, both in RT and 80°C
  • Al etch
  • Si etch
  • HF dip
  • BHF dip
  • Aqua regia
  • Piranha

Tested 3D printing filaments[edit]

ABS:

  • IC3D ABS, color: Orange, diameter: 2.85 mm

ASA:

Co-polyester:

FEP:

  • 3Dogg.com FEP, color: Transparent, diameter: 1.75 mm. Not commercially available

yet.

Nylon:

PC:

PEI:

PETG:

PETT:

PLA:

PP: